To provide an image forming method excellent in ink repellency on an upper face (exposed face opposite to a face contacting a substrate), excellent in resolution and tightness to the substrate, and capable of forming a pattern image with a line width restrained from being dispersed.
This image forming method has a photosensitive resin layer forming process for forming a photosensitive resin layer on the substrate, using a photosensitive resin composition containing an ink repellent compound, an exposure process for exposing the formed photosensitive resin layer, and a developing process for obtaining the pattern image, by developing the photosensitive resin layer after exposed, using a developer having 80 or less of contact angle A with respect to a photosensitive resin layer upper face after exposed, which is measured on basis of a method described on JIS R3257.
Kato Kazunori
Katsuichi Nishimoto
Hiroshi Fukuda
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