Title:
IMMERSION CLEANING DEVICE AND MATERIAL PIECE-CLEANING METHOD
Document Type and Number:
Japanese Patent JP3404116
Kind Code:
B2
Abstract:
PURPOSE: To prevent the chemical reaction of respective gases of different cleaning fluids from occurring and prevent the deterioration of working environment by blocking gas and mist generated from a material piece in such a manner as to encircle a grasping section of a carrying means and providing a duct for guiding the gas and mist from a blow-off means to an exhaust means.
CONSTITUTION: A magazine 8 grasped by a pawl section 9 is lowered from above a cleaning tank 4b and immersed in pure water in the cleaning tank 4b, by which water washing of a semiconductor wafer is carried out. Then the magazine 8 is immersed in a liquid hydrofluoric acid in an adjacent cleaning tank 4c by a carrying section 7, and light etching of the wafer is carried out. A duct 20 is moved together with the movement of the work carrying section 7 horizontally, and in the midway of carrying the magazine 8 from the cleaning tank 4a to 4b, gas and mist generated from the magazine 8 and cleaning fluid adhered to the wafer are blocked by the duct 20, and exhausted by clean air 13 flowing downward and the negative pressure action from an exhaust channel 12.
Inventors:
Masaaki Sadamori
Application Number:
JP7591494A
Publication Date:
May 06, 2003
Filing Date:
April 14, 1994
Export Citation:
Assignee:
Mitsubishi Electric Corporation
International Classes:
B08B3/08; H01L21/304; (IPC1-7): B08B3/08
Domestic Patent References:
| JP487334A |
Attorney, Agent or Firm:
Soga Doteru (6 people outside)
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