PURPOSE: To enable impedance matching in a short time.
CONSTITUTION: Gas of Xe 132 is sent from a gas introducing system 15 into a glass tube 14 passing through a ring of a coil 13 in a plasma generating part vacuum container 11 being put under vacuum by an air exhaust system 17, and a magnetic field is impressed inside the glass tube 14 by a magnetic field generator 12, and when a high frequency is impressed by high frequency electric power supply 16 connected to the coil 13, plasma 1 is generated. Control of a dielectric constant of this plasma is possible by control of electron density, and to change the electron density becomes possible by such operation as increasing and decreasing power output of the high frequency electric power supply 16.
MATSUI TETSUYA
TSUCHIDA KAZUTERU
