Title:
第2のRF周波数の終端を用いたインピーダンス整合ネットワーク
Document Type and Number:
Japanese Patent JP2007531963
Kind Code:
A
Abstract:
There is provided a secondary reactive termination circuit connected between the output of the RF power generator and the input of the plasma chamber to allow the tight regulation or limiting of the voltage and current components of the secondary frequencies within the process plasma. The secondary reactive circuit controls the impedance of the match network designed primarily to operate at the fundamental frequency of the RF power generator as seen by secondary frequencies in the system. A variable capacitor gives the operator the advantage of being able to tightly regulate the voltage, current, and power within a process at discrete frequencies without concern for impedance variability induced by other components in the system.
Inventors:
Blackburn, thomas joule
Masson, Christopher Sea.
Masson, Christopher Sea.
Application Number:
JP2006520280A
Publication Date:
November 08, 2007
Filing Date:
July 14, 2004
Export Citation:
Assignee:
Advanced Energy Industries, Inc.
International Classes:
H05H1/46; C23C16/00; H01J7/24; H01J37/32; H01L21/205; H01L21/3065; H03H7/38; H01L
Attorney, Agent or Firm:
Hidesaku Yamamoto
Takaaki Yasumura
Natsuki Morishita
Takaaki Yasumura
Natsuki Morishita