Title:
IMPRINT DEVICE, IMPRINT METHOD AND MANUFACTURING METHOD OF UNEVEN STRUCTURE
Document Type and Number:
Japanese Patent JP2022080723
Kind Code:
A
Abstract:
To suppress contamination of a transfer portion by components of a mold-releasing agent contained in different resin materials when the different resin materials are supplied in the same imprinting device.SOLUTION: An imprint device 10 includes a base material transport unit 13 for horizontally transporting a base material 40, a mold holding unit 18 for holding a mold 50, a first dispenser head 17A for discharging a first resin material to the base material 40, and a second dispenser head 17B for discharging a second resin material to the base material 40, an airflow forming portion 19 for forming an airflow from one side to the other. The first dispenser head 17A and the second dispenser head 17B can move between standby positions P1b and P2b and discharge positions P1a and P2a, respectively. The first resin material has higher mold-release performance than the second resin material, and the discharge position P1a of the first dispenser head 17A is not located on the upstream side of the airflow with respect to the discharge position P2a of the second dispenser head 17B.SELECTED DRAWING: Figure 2
Inventors:
ODA HIROKAZU
Application Number:
JP2020191947A
Publication Date:
May 30, 2022
Filing Date:
November 18, 2020
Export Citation:
Assignee:
DAINIPPON PRINTING CO LTD
International Classes:
H01L21/027; B05C5/00; B05C13/02; B05D1/26; B05D3/12; B29C59/02
Attorney, Agent or Firm:
Nakamura Yukitaka
Satoru Asakura
Yukihiro Hotta
Takuhisa Murata
Satoru Asakura
Yukihiro Hotta
Takuhisa Murata
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