Title:
IMPRINT METHOD, IMPRINT DEVICE, MANUFACTURING METHOD OF ARTICLE, MODEL, GENERATION METHOD OF MODEL AND PROGRAM
Document Type and Number:
Japanese Patent JP2023031137
Kind Code:
A
Abstract:
To provide an advantageous technique for easily acquiring a protruding state of an imprint material from a shot area of a substrate.SOLUTION: An imprint method for performing processing of forming a pattern of an imprint material on a substrate using a mold to each of a plurality of shot areas in the substrate comprises: an acquisition step of acquiring a model with situation information indicating a situation of the processing as input and with a protruding state of the imprint material from the shot area as output; an estimation step of estimating the protruding state of the imprint material from at least the first shot area to which the processing has already been performed with the model on the basis of the situation information acquired in the processing of the first shot area; and a determination step of determining whether or not to execute the processing to the second shot area to which the processing is scheduled to be performed after the first shot area on the basis of the protruding state of the first shot area estimated in the estimation step.SELECTED DRAWING: Figure 1
Inventors:
KOGA SHINICHIRO
WATANABE KENTO
WATANABE KENTO
Application Number:
JP2021136653A
Publication Date:
March 08, 2023
Filing Date:
August 24, 2021
Export Citation:
Assignee:
CANON KK
International Classes:
H01L21/027; B29C59/02
Attorney, Agent or Firm:
Patent Attorney Corporation Otsuka International Patent Office