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Title:
IMPRINT SYSTEM, IMPRINT METHOD, PROGRAM AND COMPUTER STORAGE MEDIUM
Document Type and Number:
Japanese Patent JP2012009831
Kind Code:
A
Abstract:

To form a prescribed resist pattern on a substrate appropriately and efficiently using a template.

An imprint system 1 has a configuration connecting together the followings: a wafer carry-in-and-out station 2; a wafer processing station 3 which forms a first resist film on a wafer W; an imprint processing station 4 which forms a second resist film on the wafer W and a prescribed resist pattern upon the second resist film; and a template carry-in-and-out station 5. The imprint processing station 4 has a plurality of imprint units 60 and a carrying unit 70 to carry the wafer W and a template T to each of the imprint units 60. The carrying unit 70 includes a wafer carrying arm to hold/carry the wafer W, and a template carrying arm to hold/carry the template T.


Inventors:
TERADA SHOICHI
HIROSHIRO KOKICHI
NISHI TAKANORI
KITANO TAKAHIRO
Application Number:
JP2011103116A
Publication Date:
January 12, 2012
Filing Date:
May 02, 2011
Export Citation:
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Assignee:
TOKYO ELECTRON LTD
International Classes:
H01L21/027; B29C59/02
Domestic Patent References:
JP2005153091A2005-06-16
JP2009265187A2009-11-12
JP2009262350A2009-11-12
JP2010040879A2010-02-18
JP2007182063A2007-07-19
JP2007329276A2007-12-20
JP2009056762A2009-03-19
Foreign References:
WO2004062886A12004-07-29
Attorney, Agent or Firm:
Tetsuo Kanamoto
Miaki Kametani
Koji Hagiwara



 
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