Title:
改良されたカソードアーク源
Document Type and Number:
Japanese Patent JP7390396
Kind Code:
B2
Abstract:
A cathode arc source comprises: a cathode target; a first magnetic field source located above the target; a second magnetic field source located below the target; and a third magnetic field source located between the first and second magnetic field sources and having an opposite polarity to the first magnetic field source; wherein the resultant magnetic field from the first, second and third magnetic field sources has zero field strength in a direction substantially normal to the target at a position above the target. The invention also provides methods of striking a cathode target and methods of depositing coatings which can be carried out using the cathode arc source described herein.
Inventors:
Shi, Shu
Yang, Min Chu
Tan, Kokuhou
Yang, Min Chu
Tan, Kokuhou
Application Number:
JP2021555503A
Publication Date:
December 01, 2023
Filing Date:
March 13, 2020
Export Citation:
Assignee:
Nanofilm Technologies International Limited
International Classes:
C23C14/32; C23C14/24; H01J37/08; H05H1/50
Domestic Patent References:
| JP2000514950A | ||||
| JP2001521065A | ||||
| JP2007305336A | ||||
| JP2015159113A |
Foreign References:
| CN102936717A | ||||
| CN101363114A |
Attorney, Agent or Firm:
Yoshihiro Nakamichi
Yuki Fujiwara
Yuki Fujiwara