Title:
アンテナと誘電体ウインドとの間にシールド電極が置かれた誘導結合型プラスマプロセスチャンバ
Document Type and Number:
Japanese Patent JP5271470
Kind Code:
B2
Abstract:
The present invention provides a process chamber and voltage distributive electrode (VDE) which distributes capacitive coupling between an inductive source and a plasma in a process chamber. The VDE is preferably slotted defining energy opaque and energy transparent portions which enable inductive coupling into the chamber while distributing capacitive coupling uniformly over the dielectric window.
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Inventors:
Todorov, Valentin, N.
Sato, Arthur
Kian, Shuyu
Liang, Robert, Yi.
Chen, Jin-yuan
Sun, Jewen
Sato, Arthur
Kian, Shuyu
Liang, Robert, Yi.
Chen, Jin-yuan
Sun, Jewen
Application Number:
JP2001517406A
Publication Date:
August 21, 2013
Filing Date:
July 12, 2000
Export Citation:
Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
H01L21/302; H01J37/32; H01L21/3065; H05H1/46
Domestic Patent References:
| JP9120958A | ||||
| JP2002516030A | ||||
| JP10275694A | ||||
| JP888220A |
Foreign References:
| WO1996025834A1 | ||||
| WO1997039607A1 |
Attorney, Agent or Firm:
Yoshiaki Anzai