Title:
Inductively-coupled-plasma processing unit
Document Type and Number:
Japanese Patent JP6228400
Kind Code:
B2
Abstract:
The invention provides an inductively coupled plasma processing apparatus, which is capable of generating uniform plasma in the interior of a processing chamber even having a segmented-type metal window. The inductively coupled plasma processing apparatus comprises a main body container (1) and a metal window (2) which is conductive and rectangular, and divides the main body container (1) into a processing chamber (4) used for accommodating to-be-processed bodies (G) and performing inductively coupled plasma processing on the to-be-processed bodies; and an antenna chamber (3) used for accommodating a high-frequency antenna (11) generating inductively coupled plasma in the processing chamber. The high-frequency antenna is arranged and routed revolvably, on the surface corresponding to the rectangular metal window, in the antenna chamber. The rectangular metal window is segmented into multiple segment pieces (2a-2d) which are isolated electrically to one another, and the segment pieces are respectively hung down from a top plate part (3b) of the antenna chamber from suspension parts (8) instead of being erected on other parts.
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Inventors:
Minoru Kasahara
Yohei Yamada
Kazuo Sasaki
Yohei Yamada
Kazuo Sasaki
Application Number:
JP2013147601A
Publication Date:
November 08, 2017
Filing Date:
July 16, 2013
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H05H1/46; C23C16/505; H01L21/3065
Domestic Patent References:
| JP2012227427A | ||||
| JP2012094690A | ||||
| JP2005285564A | ||||
| JP2001028299A | ||||
| JP2011029584A | ||||
| JP2002190450A | ||||
| JP2009205921A | ||||
| JP2009301802A |
Attorney, Agent or Firm:
Hiroshi Takayama