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Title:
INJECTING COLD CATHODE HAVING NEGATIVE ELECTRON AFFINITY BASED ON WIDE GAP SEMICONDUCTOR STRUCTURE
Document Type and Number:
Japanese Patent JP2003123626
Kind Code:
A
Abstract:

To provide a cold cathode that has large current emission performance and stability.

The cold cathode electron emitter comprises a wide band gap (WBG) semiconductor that is n+ doped in high concentration, p doped WBG region, and a metallic layer having a low work function. A different configuration of this structure includes a region that is p+ doped in high concentration between the p region and the metallic layer. By these structures, large current can be emitted with stable (durable) operation. The reason why large current density is realized is that the p doped region and the p+ doped region work as a material of negative electron affinity when they contact the metal of low work function. The injecting emitter that has n+-p-M and n+-p-p+-M structures uses relatively low electric field and is not affected by the contamination and/or absorption of the accelerated ion, and therefore is stable.


Inventors:
OSSIPOV VIATCHESLAV V
BRATKOVSKI ALEXANDRE M
BIRECKI HENRYK
Application Number:
JP2002295743A
Publication Date:
April 25, 2003
Filing Date:
October 09, 2002
Export Citation:
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Assignee:
HEWLETT PACKARD CO
International Classes:
H01J1/308; (IPC1-7): H01J1/308
Attorney, Agent or Firm:
Tsukio Okada (2 outside)