PURPOSE: To obtain an ink jet head capable of raising whole dot density by performing densification by a method wherein nozzles are, in a two dimensional manner, arranged on the same substrate.
CONSTITUTION: A semiconductor substrate 1 is composed of Si. A nozzle 8 is formed by anisotropic etching and a silicon oxide layer is provided. A first dry film 2 is wound by pressure thereon, and a passage 9, a common solution chamber 10, and an ink pressure chamber 11 are formed by a photolithographic method. Thereafter, a second layer dry film 3 is fixed by pressure onto the dry film 2 to be exposed. Then, a vibration plate 4 is formed on this ink pressure chamber part, and a lower electrode 5 is formed with aluminum and chromium platinum by the lift off method. Thereafter, a piezo-electric film 6 part is formed. Then, an upper electrode 7 is formed thereon by the lift off method with aluminum and chromium platinum. Lastly after forming an ink pressure chamber by dissolution removal of a part where the ink pressure chamber part of the second layer dry film 3 is left exposed, polarization treatment is performed by applying voltage between the upper and the lower electrodes.
AMEYAMA MINORU
KOMAI HIROMICHI
NARUSE OSAMU
MATSUMOTO SHUZO
