To provide an improved method for variable pattern formation of a dampening solution and an improved method for variable imaging lithographic marking systems of various forms.
An ink rheology control subsystem for controlling the rheology of ink applied to an imaging surface of a variable data lithography system 10 comprises an ink reservoir, an ink application subsystem 46 for applying ink from the ink reservoir over the imaging surface at a first ink temperature, and an ink complex viscoelastic modulus control subsystem for modifying the complex viscoelastic modulus of the ink from a first value at the ink reservoir to a second value prior to transfer of the ink from the imaging surface to a substrate. The ink complex viscoelastic modulus control subsystem may comprise a partial curing stage, such as a photo-curing stage. The ink may optionally include phtotoinitiators to assist with the partial curing. Alternatively, the ink complex viscoelastic modulus control subsystem may consist of an ink pre-heating subsystem and/or a post-application cooling system.
PATTEKAR ASHISH
BIEGELSEN DAVID K
PEETERS ERIC
LARSON JAMES R
| JPH0724991A | 1995-01-27 | |||
| JPH01299040A | 1989-12-01 | |||
| JPH08309961A | 1996-11-26 | |||
| JPS5682257A | 1981-07-04 | |||
| JPS4747726B | ||||
| JP2000506091A | 2000-05-23 | |||
| JP3008637U | 1995-03-20 | |||
| JPH04359765A | 1992-12-14 |
| US20100031838A1 | 2010-02-11 |
Kato Kazunori
Shinji Oga
Hiroyuki Hyakumoto