To provide an inspection instrument of a circuit pattern whose defective inspection performance is improved by controlling the electrification status according to a structure or a material of the circuit pattern which is an inspection object.
The inspection instrument of the circuit pattern comprises the steps of: detecting a secondary electron generated by irradiating an electron beam to a substrate in which the circuit pattern is formed; and detecting an abnormality of the circuit pattern, and is equipped with: a stage which installs the substrate and continuously moves; a scanning signal generator which gives to a scanning deflection machine a scanning signal for repeatedly scanning the electron beam in almost right angle direction to the moving direction during the movement of the stage; and a control circuit which transmits to the scanning signal generator a control signal obtained by changing a scanning time per one time out of the repeating scanning signals according to the structure or the material of the circuit pattern.
MIYAI YASUSHI
JP2000331635A | 2000-11-30 | |||
JP2005175333A | 2005-06-30 | |||
JP2000314710A | 2000-11-14 | |||
JPS6312146A | 1988-01-19 |