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Title:
INSPECTION INSTRUMENT AND INSPECTION METHOD OF CIRCUIT PATTERN
Document Type and Number:
Japanese Patent JP2008166635
Kind Code:
A
Abstract:

To provide an inspection instrument of a circuit pattern whose defective inspection performance is improved by controlling the electrification status according to a structure or a material of the circuit pattern which is an inspection object.

The inspection instrument of the circuit pattern comprises the steps of: detecting a secondary electron generated by irradiating an electron beam to a substrate in which the circuit pattern is formed; and detecting an abnormality of the circuit pattern, and is equipped with: a stage which installs the substrate and continuously moves; a scanning signal generator which gives to a scanning deflection machine a scanning signal for repeatedly scanning the electron beam in almost right angle direction to the moving direction during the movement of the stage; and a control circuit which transmits to the scanning signal generator a control signal obtained by changing a scanning time per one time out of the repeating scanning signals according to the structure or the material of the circuit pattern.


Inventors:
HAYAKAWA KOICHI
MIYAI YASUSHI
Application Number:
JP2007000021A
Publication Date:
July 17, 2008
Filing Date:
January 04, 2007
Export Citation:
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Assignee:
HITACHI HIGH TECH CORP
International Classes:
H01L21/66; G01N23/225; H01J37/28
Domestic Patent References:
JP2000331635A2000-11-30
JP2005175333A2005-06-30
JP2000314710A2000-11-14
JPS6312146A1988-01-19
Attorney, Agent or Firm:
Manabu Inoue