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Title:
INSPECTION METHOD FOR DEFECT ON SURFACE OF OBJECT
Document Type and Number:
Japanese Patent JPS564040
Kind Code:
A
Abstract:

PURPOSE: To unfailingly find out defects including cracks on the surface of an object, for example, a semiconductor substrate, by successively radiating to a surface of a semiconductor substrate rays of light from a plurality of light sources disposed in different positions around the semiconductor substrate.

CONSTITUTION: Light sources 13, 23, 33, 43 disposed around a semiconductor substrate 2, which is placed on an object stage 1a of a stereoscopic microscope 1, are turned on and off in order. When there is a crack 4 on the surface of the substrate 2, the direction in which an inclined portion 4a of the crack 4 is extended is different from at least one direction among a plurality of directions in which rays of light are radiated from the light sources 13, 23, 33, 43, so that the crack 4 castes a shadow 5. Therefore, the crack 4 can be found out unfailingly.


Inventors:
INOUCHI TAKATOSHI
Application Number:
JP8092479A
Publication Date:
January 16, 1981
Filing Date:
June 25, 1979
Export Citation:
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Assignee:
MITSUBISHI ELECTRIC CORP
International Classes:
G01N21/88; G01N21/84; G01N21/89; G01N21/956; (IPC1-7): G01N21/88



 
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