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Title:
INSULATING FILM FORMING METHOD EMPLOYING LIQUID DROP DISCHARGING SYSTEM, METHOD OF MANUFACTURING SURFACE ACOUSTIC WAVE ELEMENT PIECE, SURFACE ACOUSTIC WAVE ELEMENT, AND SURFACE ACOUSTIC WAVE DEVICE
Document Type and Number:
Japanese Patent JP2006238327
Kind Code:
A
Abstract:

To provide an insulating film forming method employing a liquid drop discharging system appropriate for manufacturing a surface acoustic wave element piece.

In an insulating film forming method employing a liquid drop discharging system for forming an insulating film covering a pattern electrode of a uniform film thickness formed on a piezoelectric substrate, liquid drops of insulating film forming materials whose discharge amounts are controlled are selectively applied to an insulating film forming portion of metal wiring formed on the piezoelectric substrate by the liquid drop discharging system and to the piezoelectric substrate, and the insulating film forming portion and a non-forming portion are formed on the metal wiring. The insulating film forming materials use inorganic materials.


Inventors:
YOSHIZAWA GEN
Application Number:
JP2005053360A
Publication Date:
September 07, 2006
Filing Date:
February 28, 2005
Export Citation:
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Assignee:
SEIKO EPSON CORP
International Classes:
H03H3/08; B05D1/26; B05D5/12; H03H9/145
Attorney, Agent or Firm:
Yuichi Murakami
Okubo Misao