Title:
PURE WATER SUPPLY SYSTEM AND WASHING METHOD
Document Type and Number:
Japanese Patent JP3235621
Kind Code:
B2
Abstract:
PURPOSE: To provide a washing method to remove completely trace impurities from the surface of silicon by contacting pure water and a pure water supply system by degassing nitrogen and oxygen dissolved in water and by improving the wettability of water to the surface of a substrate, especially to the surface of a silicon wafer eliminated of its insulation membrane.
CONSTITUTION: A pure water supply system is equipped with a device 10 for degassing nitrogen and oxygen dissolved in water in the way of a pipeline for supplying pure water to a use point 14. Moreover, a container in which pure water and gas coexist is placed between a degassing device and the use point 14 so that the container is filled with a gas containing neither nitrogen nor oxygen. In a gas washing method, a substrate is washed with pure water supplied from the pure water supply system.
Inventors:
Tadahiro Ohmi
Application Number:
JP18814691A
Publication Date:
December 04, 2001
Filing Date:
July 02, 1991
Export Citation:
Assignee:
Tadahiro Ohmi
UCT Co., Ltd.
UCT Co., Ltd.
International Classes:
B01D19/00; C02F1/20; C02F1/30; H01L21/304; (IPC1-7): B01D19/00; C02F1/20; H01L21/304
Domestic Patent References:
| JP1211926A | ||||
| JP3154682A | ||||
| JP440270A | ||||
| JP4190803A | ||||
| JP418977A | ||||
| JP3154601A |
Attorney, Agent or Firm:
Hisao Fukumori