Title:
イオンビーム装置、イオン注入装置、イオンビーム放出方法
Document Type and Number:
Japanese Patent JP6480222
Kind Code:
B2
Abstract:
To enable removal of reaction by-product deposited on an extraction electrode so as to be capable of immediately returning to ion beam irradiation. A positive voltage period for applying a positive voltage to an extraction electrode 34 is set, electrons are generated in an ion source 33, extracted from the ion source 33, and applied to the extraction electrode 34 to heat the extraction electrode 34. A reaction by-product layer 27 evaporates in a vacuum atmosphere to remove the reaction by-product layer 27. Cleaning gas is introduced into the ion source 33 to generate positive ions of the cleaning gas, a negative voltage period for applying a negative voltage to the extraction electrode 34 is set, and by irradiating the extraction electrode 34 with the positive ions of the cleaning gas, the reaction by-product layer 27 may be removed through sputtering or etching reaction.
Inventors:
Tokuyasu Sasaki
Akio Higashi
Akio Higashi
Application Number:
JP2015054699A
Publication Date:
March 06, 2019
Filing Date:
March 18, 2015
Export Citation:
Assignee:
ULVAC, Inc.
International Classes:
H01J37/08; H01J27/20
Domestic Patent References:
| JP6119896A | ||||
| JP2011113714A | ||||
| JP2066839A |
Attorney, Agent or Firm:
Shigeo Ishijima
Hideki Abe
Hideki Abe
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