Title:
イオンビーム装置
Document Type and Number:
Japanese Patent JP6370085
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide an ion beam device capable of changing ion energy to perform irradiation when observation, processing and measurement are performed using ion beams, thereby achieving super high resolution observation, low damage observation, high accuracy dimensional measurement and super fine fast processing according to set conditions.SOLUTION: An ion beam device including a gas electric field ionization ion source capable of ionizing at least two kinds of gases and an electrostatic objective lens comprising four electrodes includes a control device that at least stores: an application voltage on each electrode of the electrostatic lens and a sample voltage with respect to a first accelerating voltage in the irradiation of a first kind gas ion; and an application voltage on each electrode of the electrostatic lens and a sample voltage with respect to a second accelerating voltage different from the first accelerating voltage in the irradiation of a second kind gas ion.
Inventors:
Hiroyasu Shichi
Shinichi Matsubara
Yoshimi Kawanami
Hiroyuki Muto
Shinichi Matsubara
Yoshimi Kawanami
Hiroyuki Muto
Application Number:
JP2014082444A
Publication Date:
August 08, 2018
Filing Date:
April 14, 2014
Export Citation:
Assignee:
Hitachi High-Technologies Corporation
International Classes:
H01J37/28; H01J27/26; H01J37/08; H01J37/12; H01J37/20; H01J37/248; H01J37/317
Domestic Patent References:
| JP2013254722A | ||||
| JP2011086465A | ||||
| JP2009140925A | ||||
| JP64019664A |
Attorney, Agent or Firm:
Polaire Patent Business Corporation