Title:
Ion beam equipment
Document Type and Number:
Japanese Patent JP6116631
Kind Code:
B2
Abstract:
Provided is an ion beam device provided with a gas electric field ionization ion source which can prevent an emitter tip from vibrating in a non-contact manner. The gas electric field ionization ion source is comprised of an emitter tip (21) for generating ions; an emitter base mount (64) for supporting the emitter tip; an ionizing chamber which has an extraction electrode (24) opposed to the emitter tip and which is configured so as to surround the emitter tip (21); and a gas supply tube (25) for supplying gas to the vicinity of the emitter tip. The emitter base mount and a vacuum container magnetically interact with each other.
Inventors:
Hiroyasu Shichi
Shinichi Matsubara
Norihide Saho
Noriaki Arai
Toru Ishitani
Shinichi Matsubara
Norihide Saho
Noriaki Arai
Toru Ishitani
Application Number:
JP2015167583A
Publication Date:
April 19, 2017
Filing Date:
August 27, 2015
Export Citation:
Assignee:
Hitachi High-Technologies Corporation
International Classes:
H01J37/28; H01J27/26; H01J37/08; H01J37/16
Domestic Patent References:
| JP2009054589A | ||||
| JP2015092496A |
Foreign References:
| WO2007067310A1 |
Attorney, Agent or Firm:
Polaire Patent Business Corporation