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Title:
ION BEAM GENERATION DEVICE
Document Type and Number:
Japanese Patent JP2015053108
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an ion beam generation device capable of producing plasma with high uniformity and performing more uniform processing.SOLUTION: An ion beam generation device includes: a discharge tank 3; plasma generation means 5 for generating plasma in the discharge tank; an extraction electrode 7 that is provided to oppose a predetermined wall of the discharge tank and extracts an ion beam from the plasma; a member 4 that is provided in the discharge tank, is rotatable, and has an asymmetric shape about its rotation axis; and drive means for rotating the member, wherein the plasma generation means and the drive means are activated to rotate the member for a predetermined time while generating the plasma in the discharge tank, thereby uniformizing a time-averaged plasma density distribution.

Inventors:
AKASAKA HIROSHI
KAMIYA YASUSHI
TSUJIYAMA MASAYUKI
Application Number:
JP2011264236A
Publication Date:
March 19, 2015
Filing Date:
December 02, 2011
Export Citation:
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Assignee:
CANON ANELVA CORP
International Classes:
H01J27/16; H01J37/08
Attorney, Agent or Firm:
Iwata Today sentence
Hideo Mano



 
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