Title:
イオンビーム用イオン化チャンバーおよびイオンビーム強度をモニターする方法
Document Type and Number:
Japanese Patent JP4435426
Kind Code:
B2
Abstract:
The invention relates to an ionization chamber for ion beams and to a method of monitoring the intensity of an ion therapy beam by way of such an ionization chamber. For that purpose, the ionization chamber includes a chamber housing, a beam inlet window and a beam outlet window, a chamber volume filled with counting gas, a high-voltage anode and a high-voltage cathode, wherein the ionization chamber is constructed flat and sandwich-like from plate-shaped large-surface-area structures of the above-mentioned components, which are aligned orthogonally relative to the axis of the ion beam, and a centrally arranged large-surface-area orthogonally aligned plate-shaped counting anode is surrounded on both sides by a large-surface-area plate-shaped high-voltage cathode consisting of two parallel cathode plates, and the chamber housing consists of a housing frame, which frames a square ionization chamber volume, and on which frame the beam inlet window and the beam outlet window are mounted gas-impermeably.
Inventors:
Harbert stealther
Bernd Boss
Bernd Boss
Application Number:
JP2000600290A
Publication Date:
March 17, 2010
Filing Date:
February 18, 2000
Export Citation:
Assignee:
GS I Gezel Shaft Fuerschber Ionen Forshunck Mbha
International Classes:
G01T1/18; H01J47/02; A61N5/10; G01T1/185; H01J7/24
Domestic Patent References:
| JP5041196A | ||||
| JP3163392A | ||||
| JP8248138A | ||||
| JP6096721A | ||||
| JP2183959A |
Attorney, Agent or Firm:
Takashi Shoji