Title:
イオンビーム照射装置、イオン源の着脱方法
Document Type and Number:
Japanese Patent JP6418262
Kind Code:
B2
Abstract:
The present invention provides an ion beam irradiation apparatus and an ion source detaching method capable of improving the efficiency of ion source detaching work and simplifying the structure of anion source detaching jig. The ion beam irradiation apparatus (ID) includes a cabinet (12) having a floor surface (4) higher than a floor surface (11) on which the ion beam irradiation apparatus (ID)is disposed and in which an ion source (1) is accommodated; and a passage (P) formed in a part of the floor surface of the cabinet (12) from the outer peripheral end of the cabinet (12) toward the inside, the height of the floor surface of the cabinet (12) in which the passage (P) is formed being lower than other portions and substantially the same as the height of the floor surface (11) on whichthe ion beam irradiation device (ID) is disposed.
Inventors:
Ippei Nishimura
Yuichi Niwa
Masatoshi Onoda
Junichi Tachimichi
Yuichi Niwa
Masatoshi Onoda
Junichi Tachimichi
Application Number:
JP2017044966A
Publication Date:
November 07, 2018
Filing Date:
March 09, 2017
Export Citation:
Assignee:
Nissin Ion Equipment Co., Ltd.
International Classes:
H01J27/02; H01J37/248
Domestic Patent References:
| JP5334987A |
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