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Title:
ION BEAM PROCESSING DEVICE
Document Type and Number:
Japanese Patent JPH08134646
Kind Code:
A
Abstract:

PURPOSE: To provide an ion beam processing device capable of irradiating respective samples with ion beams with a simple structure.

CONSTITUTION: An ion beam generator 1, plural holding mechanisms 11 which attachably and detachably holds the respective plural samples to be irradiated with the ion beams, a treating chamber 4 in which processing by the ion beams is executed, a prepn. chamber 5 in which the samples are once stored, a transporting device 6 which transports the samples and plural holding mechanisms 11 are respectively subjected to first rotational driving to rotate the holding mechanisms 11 in such a manner that the samples rotate in the holding positions where the samples are held. Simultaneously, the device is provided with a rotational driving mechanism 3 which executes second rotational driving to rotate the holding mechanisms 11 so as to move the revolving axis of rotation moves on the predetermined circumference and a fine adjusting mechanism 23 which rotates the holding mechanisms 11 in such a manner that the samples rotate in the holding positions described above at the time when the rotational driving mechanism 3 does not execute the first rotational driving and the second rotational driving.


Inventors:
ONUKI HISAO
OISHI SEITARO
Application Number:
JP27362894A
Publication Date:
May 28, 1996
Filing Date:
November 08, 1994
Export Citation:
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Assignee:
HITACHI LTD
International Classes:
C23C14/56; (IPC1-7): C23C14/56
Attorney, Agent or Firm:
Kazuko Tomita