PURPOSE: To evaluate the observation of a fine region and the analysis of a trace quantity at the same location by constituting a focusing lens, a deflecting means and an astigmatic correcting means with an electrostatic means in a charged particle radiating system.
CONSTITUTION: A charged particle source material reservoir 2 is heated by electrons emitted from an electron shock filament 5. As a result, a charged particle source material 3 is melted, the tip of an emitter chip 1 is wetted by the material 3. The ion extracting voltage is applied across the chip 1 and an electrode 6 under this condition to extract positive ions. For the electron beam formation, the heating current of the filament 5 is instantly dropped to zero or the electric field between the filament 5 and the material reservoir 2 is dropped to zero while the ion extracting voltage is kept constant under ion beam extracting conditions, thus the material 3 is quickly cooled and solidified while maintaining a sharp cone. An electron beam is extracted from the tip of the chip 1 by an electric field emitting mechanism by keeping the chip 1 at the negative potential and the extracting electrode at the zero potential.
IKEBE YOSHINORI
TOIDA HIROSHI
HITACHI INSTRUMENTS ENG
| JPS6353844A | 1988-03-08 | |||
| JPS57147856A | 1982-09-11 | |||
| JPS58135557A | 1983-08-12 |
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