ION IMPLANTATION DEVICE

Japanese Patent JP3264983

B2

PURPOSE: To mount a rotation shaft of the holding board of a material to be processed of an ion implantation device, in a vacuum chamber without reducing the airtightness of the vacuum chamber, and to adjust the position of the holding board of the material to be processed in the right and left even when a tilt shaft for tilting the holding board of the material to be processed is to be provided in the rotation shaft.
CONSTITUTION: A first rotation shaft 31 is supported by shaft with one side wall 13 of a vacuum chamber 1 through a shaft support part 34, while a shaft support part 7 of a second rotation shaft part 32 is mounted on the other side wall 14 through a bellows body 72. The rotation shaft parts 31, 32 can be slid with one another, and can be rotated in an integrated manner, while the rotation shaft part 32 is screwed into a nut 60 for adjusting position to be fixed to the side of the rotation shaft part 31, and the rotation shaft parts 31, 32 are slid with one another in a correlated manner by the nut 60. Tilt shaft parts 51, 52 are supported by shaft in the rotation shaft parts 31 and 32, respectively, and they are connected together so that they can be slid with one another and rotated in an integrated manner, while a platen part 4 for holding a wafer is mounted on the side of the rotation shaft 32.

Tetsuo Nakata

JP17490992A

March 11, 2002

June 09, 1992

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東京エレクトロン株式会社
バリアンセミコンダクターイクイップメント株式会社

H01J37/317; H01L21/265; (IPC1-7): H01J37/317

JP2278643A
JP525629A
JP61263038A
JP6120953U
JP299983U

Toshio Inoue

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