Title:
イオン注入装置、イオン源
Document Type and Number:
Japanese Patent JP7220122
Kind Code:
B2
Abstract:
To provide an ion implanter in which an ion beam does not collide with an einzel lens.SOLUTION: Plasma of ionization gas is formed by confining electrons by means of a magnet device 6, ions in the plasma are withdrawn by an extraction electrode 24 on the bottom face of a first cylindrical part 21, and focused by an einzel lens 30 constituted of a central cylindrical electrode 33 placed in a second cylindrical part 22, first and second cylindrical electrodes 31, 32 at both ends of the second cylindrical part 22, and the distance between the first and second cylindrical electrodes 31, 32 and the central cylindrical electrode 33 is set to zero in the center axis line direction. Furthermore, a magnetic field formed by the magnet device 6 is made to have no impact on the einzel lens 30 by a magnetic shield device 8, and the einzel lens 30 is brought close to the extraction electrode 24. A compact ion implanter 2 capable of focusing an ion beam before spreading can be provided.SELECTED DRAWING: Figure 2
Inventors:
Akio Azuma
Application Number:
JP2019105167A
Publication Date:
February 09, 2023
Filing Date:
June 05, 2019
Export Citation:
Assignee:
ULVAC, Inc.
International Classes:
H01J37/317; H01J27/18; H01J37/08
Domestic Patent References:
| JP61076665A |
Foreign References:
| US20100289409 |
Attorney, Agent or Firm:
Patent Attorney Corporation Minami Aoyama International Patent Office
Junichi Omori
Takahashi Mitsuru
Teppei Nakamura
Hibino Yukinobu
Junichi Omori
Takahashi Mitsuru
Teppei Nakamura
Hibino Yukinobu