Title:
ION IMPLANTER
Document Type and Number:
Japanese Patent JPH01154435
Kind Code:
A
Abstract:
PURPOSE:To simplify the structure and to improve the ionization efficiency by leading a gas to be ionized to an ion generating chamber, generating a high-frequency discharge under a depressurized condition to generate a gas plasma, and picking up the generated ions from the drawing-out port of an ion drawing-out electrode. CONSTITUTION:In an ion generating chamber 1, a discharge electrode 13 insulated by a box body 11, insulators 12, and the like, is provided in the box body 11 with a gas leading port 4, and the ion generating chamber 1 is composed to generate a high-frequency discharge by connecting to a high-frequency power source 14. And an ion drawing-out electrode 5 is provided positioned in front of the box body 11 and connected to the negative electrode of a power source 15. A gas to be ionized is led to the ion generating chamber 10, a high-frequency discharge is carried out under a depressurized condition to generate a gas plasma, and the generated ions are picked up from the ion drawing-out port 8 of the ion drawing-out electrode 5. In such a composition, ions can be generated in a simple structure, and the ionization efficiency can be increased.
Inventors:
ARIMA YASUO
Application Number:
JP31472787A
Publication Date:
June 16, 1989
Filing Date:
December 10, 1987
Export Citation:
Assignee:
FUJITSU LTD
International Classes:
H01J27/16; H01J37/08; H01L21/265; (IPC1-7): H01J27/16; H01J37/08; H01L21/265
Attorney, Agent or Firm:
Sadaichi Igita