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Patent Searching and Data


Title:
ION IMPREGNATING METHOD AND ION IMPREGNATING DEVICE
Document Type and Number:
Japanese Patent JP2000038655
Kind Code:
A
Abstract:

To easily and efficiently impregnate ions without the intrusion of impurities even in the case of a substrate having a cubic shape.

A gas for generating plasma contg. impregnating substance is introduced into a vacuum vessel 1. A microwave 3 is transmitted to a metallic tube 5 communicated to the vacuum vessel 1 from a waveguide 3, and plasma 14 is generated in the metallic tube 5. This plasma 14 is transferred to the side of the vacuum vessel 1 by the magnetic field 15 generated from a coil 6 and is made the uniform, sheet-shaped plasma 14 of a large area in the vacuum vessel 1 because of being pulled to the inner part of the vacuum vessel 1 by a permanent magnet 7. While base materials 10-1 to 10-3 are held in this plasma 14, by applying pulse-shaped high voltage bias voltage to the base materials 10-1 to 10-3 by a pulse high voltage power source 11, the base materials 10-1 to 10-3 are impregnated with the ions in the plasma 14.


Inventors:
YAMASHITA NOBUKI
WATANABE TOSHIYA
YOSHIDA MITSUHIRO
Application Number:
JP20730898A
Publication Date:
February 08, 2000
Filing Date:
July 23, 1998
Export Citation:
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Assignee:
MITSUBISHI HEAVY IND LTD
International Classes:
H05H1/46; B23P9/00; C23C14/22; (IPC1-7): C23C14/22; B23P9/00; H05H1/46
Attorney, Agent or Firm:
Toshiro Mitsuishi (2 outside)