To provide an ion milling device capable of performing ion milling processing for forming different depths in one processing.
An ion milling device is provided with an extraction electrode 20 that is disposed between a plasma generating chamber and a processing chamber, has an acceleration electrode 21 applied with a positive voltage and a deceleration electrode 22 applied with a negative voltage and extracts an ion beam from the plasma generating chamber to the processing chamber. The acceleration electrode 21 is formed in a plate-like shape. On a surface of the deceleration electrode 22 opposite to the acceleration electrode 21, stepped portions 25a, 25b and 25c are provided at a peripheral edge of a second extraction hole 24 in a thickness direction of the deceleration electrode 22. The ion milling device is configured such that perpendicular distances h1, h2 and h3 between an edge 23 of a first extraction hole 23 of the acceleration electrode 21 and an edge 24a of the second extraction hole 24 of the deceleration electrode 22 opposite to the edge 23 are different from one another.
Osamu Suzawa
Kazuhiko Miyasaka