Title:
ION SOURCE AND ION BEAM DEVICE
Document Type and Number:
Japanese Patent JP2022095202
Kind Code:
A
Abstract:
To provide an ion source capable of reducing the distance between a plasma generation space and a plasma generation coil.SOLUTION: An ion source 100 includes; a vacuum container 2 into which gas is introduced; a plasma generation coil 4 that is placed outside the vacuum container 2 and generates plasma in a plasma generation space 3 inside the vacuum container 2; a high-frequency power supply 10 that supplies a high-frequency voltage to the plasma generation coil 4 via a coupling circuit 30; an anode 40 for accelerating the ions generated in the plasma generation space 3; and an acceleration voltage power supply 50 that supplies an acceleration voltage Vacc to the anode 40, in which the acceleration voltage Vacc is supplied to the plasma generation coil 4 via a resistor 60 as an impedance element.SELECTED DRAWING: Figure 1
Inventors:
KASHIWAGI TAKESHI
KASAHARA HARUO
KASAHARA HARUO
Application Number:
JP2020208388A
Publication Date:
June 28, 2022
Filing Date:
December 16, 2020
Export Citation:
Assignee:
JEOL LTD
International Classes:
H01J27/16; H01J37/04; H01J37/08; H01J37/248; H01J37/317; H05H1/46
Attorney, Agent or Firm:
Fuse Yukio
Michie Obuchi
Yoshinobu Yoshida
Michie Obuchi
Yoshinobu Yoshida
Previous Patent: Charged particle beam device
Next Patent: Sheet processing device and image forming system equipped with it
Next Patent: Sheet processing device and image forming system equipped with it