Title:
イオン源、およびこれを用いた円形加速器ならびに粒子線治療システム
Document Type and Number:
Japanese Patent JP7096779
Kind Code:
B2
Abstract:
The ion source includes a microwave power supply provided outside main magnetic poles, a radiofrequency waveguide and an antenna configured to introduce a microwave generated by the microwave power supply to a region to which a magnetic field generated by the main magnetic poles is applied, and a magnetic field generation unit provided inside a hole provided in a part of the main magnetic poles and configured to generate a magnetic field in a direction opposite to that of the magnetic field generated by the main magnetic poles. Plasma is generated inside the main magnetic poles by a magnetic field generated by applying the magnetic field generated by the magnetic field generation unit in the opposite direction to the main magnetic field decreased according to a diameter of the hole and the microwave introduced by the radiofrequency waveguide and the antenna.
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Inventors:
Takayoshi Seki
Application Number:
JP2019024347A
Publication Date:
July 06, 2022
Filing Date:
February 14, 2019
Export Citation:
Assignee:
株式会社日立製作所
International Classes:
H01J27/16; A61N5/10; G21K1/00; H01J37/08; H05H1/46; H05H13/00
Domestic Patent References:
| JP2018524764A | ||||
| JP2012142139A | ||||
| JP9115698A |
Foreign References:
| WO2018096648A1 |
Attorney, Agent or Firm:
Patent Attorney Corporation Kaichi
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