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Patent Searching and Data


Title:
イオン源装置、粒子線発生装置、およびイオンビーム生成方法
Document Type and Number:
Japanese Patent JP6942347
Kind Code:
B2
Abstract:
There are provided a small-sized ion source device, a particle beam generation device, and an ion beam generation method which generate a plurality of ion species while switching the ions species in a short time. An ion source device 1 which generates an ion beam from gas introduced into a vacuum, the ion source device including: a chamber 12 whose inside is a vacuum; a gas supply unit 26 which supplies gas to the inside of the chamber; and an ionization energy supply unit which supplies ionization energy for ionizing atoms of the gas to the inside of the chamber, wherein the gas supply unit 26 includes: a plurality of gas cylinders (17A, 17B, and 17C) each of which is filled with each of a plurality types of gases; pipes (24A, 24B, 24C, and 25) connected to the gas cylinders to feed the gases to the chamber; and pulse-control gas valves (21A, 21B, and 21C) which are attached to the pipes and are settable to an open state in a pulsed manner for a short period of time.

Inventors:
Kota Mizushima
Yoshiyuki Iwata
Muramatsu Masayuki
Toshiyuki Shirai
Application Number:
JP2018021802A
Publication Date:
September 29, 2021
Filing Date:
February 09, 2018
Export Citation:
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Assignee:
National Institute for Quantum Science and Technology
International Classes:
H01J27/18; A61N5/10; G21K5/04
Domestic Patent References:
JP5290750A
Foreign References:
US5438205
Attorney, Agent or Firm:
Hironori Nishihara