Title:
ION SOURCE AND ION IMPLANTATION DEVICE
Document Type and Number:
Japanese Patent JP2023042906
Kind Code:
A
Abstract:
To improve performance of an ion source for handling halogen-containing gas.SOLUTION: An ion source IS, which is an ion source for handling halogen-containing gas as a material gas, includes a plasma generating container 1 within which plasma P is generated on the basis of the material gas, and exposure members (1, 2 and L1-L3) that are exposed to the plasma P. The exposure members (1, 2 and L1-L3) at least partially employ a carbon member. A cooling mechanism C for cooling the carbon member is provided.SELECTED DRAWING: Figure 2
Inventors:
FUJIMOTO RYUGO
Application Number:
JP2021150321A
Publication Date:
March 28, 2023
Filing Date:
September 15, 2021
Export Citation:
Assignee:
NISSIN ION EQUIPMENT CO LTD
International Classes:
H01J37/08; H01J27/08; H01J37/317