Title:
イオン源およびそのクリーニング方法
Document Type and Number:
Japanese Patent JP7104898
Kind Code:
B2
Abstract:
An ion source includes a plasma chamber, and a suppression electrode disposed downstream of the plasma chamber, and is operable to irradiate the suppression electrode with an ion beam produced from a cleaning gas to clean the suppression electrode. Prior to cleaning, the ion source moves the suppression electrode or the plasma chamber in a first direction to increase a distance between the plasma chamber and the suppression electrode.
Inventors:
Adachi Masakazu
Yuya Hirai
Tomoya Taniguchi
Yuya Hirai
Tomoya Taniguchi
Application Number:
JP2019037302A
Publication Date:
July 22, 2022
Filing Date:
March 01, 2019
Export Citation:
Assignee:
Nissin Ion Equipment Co., Ltd.
International Classes:
H01J37/08; H01J27/02
Domestic Patent References:
| JP2011124215A | ||||
| JP2002216700A | ||||
| JP2016541086A |