Title:
イオン源およびその運転方法
Document Type and Number:
Japanese Patent JP4179337
Kind Code:
B2
Abstract:
An ion source is provided that can generate an ion beam in which the width is wide, the beam current is large, and the uniformity of the beam current distribution in the width direction is high, and that can prolong the lifetime of a cathode. The ion source 2a has: a plasma generating chamber 6 having an ion extraction port 8 extending in the X direction; a magnet 14 which generates a magnetic field 16 extending along the X direction, in the plasma generating chamber 6; indirectly-heated cathodes 20 which are placed respectively on the both sides of the plasma generating chamber 6 in the X direction, and which are used for generating a plasma i0 in the chamber 6, and increasing or decreasing the density of the whole of the plasma 10; and plural filament cathodes 32 which are juxtaposed in the X direction in the plasma generating chamber 6, and which are used for generating the plasma i0 in the chamber 6, and controlling the density distribution of the plasma 10.
Inventors:
Takatoshi Yamashita
Application Number:
JP2006137839A
Publication Date:
November 12, 2008
Filing Date:
May 17, 2006
Export Citation:
Assignee:
Nissin Ion Equipment Co., Ltd.
International Classes:
H01J27/02; H01J27/04; H01J27/08; H01J37/08
Domestic Patent References:
| JP11025872A | ||||
| JP2000315473A | ||||
| JP7211275A | ||||
| JP8111198A |
Attorney, Agent or Firm:
Keiji Yamamoto