Title:
ION SOURCE, AND ION PROCESSING APPARATUS
Document Type and Number:
Japanese Patent JP2016126938
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a high density small diameter ion beam.SOLUTION: Outside of an electrode exposure part 15, located around the outlet 18 of an anode electrode 24, is covered with an insulation member 14, and the surface of the electrode exposure part 15 and the surface of the insulation member 14 are exposed in an arc chamber 22. Spread of an arc current flow 62, attracted from a plasma generated in a generation chamber 21 by means of the anode electrode 24, is reduced and the density of positive ions of ionized gas collected around the outlet 18 is increased. Since an ion beam 63 is attracted from an aggregation of high density positive ions by means of an extraction electrodes 41, a high density small diameter ion beam 63 is obtained.SELECTED DRAWING: Figure 2
Inventors:
TAKAHASHI TEPPEI
SASAKI NORIYASU
TERASAWA HISAHIRO
SASAKI NORIYASU
TERASAWA HISAHIRO
Application Number:
JP2015000852A
Publication Date:
July 11, 2016
Filing Date:
January 06, 2015
Export Citation:
Assignee:
ULVAC CORP
International Classes:
H01J27/20; H01J37/08
Domestic Patent References:
| JPH02216813A | 1990-08-29 | |||
| JPH1167115A | 1999-03-09 |
Attorney, Agent or Firm:
Shigeo Ishijima
Hideki Abe
Hideki Abe