Title:
ION SOURCE
Document Type and Number:
Japanese Patent JP2022092639
Kind Code:
A
Abstract:
To improve the success rate of plasma lighting in a high frequency ion source.SOLUTION: High frequency ion sources RF1 to RF5 include a plasma container 4 with an ion extraction opening 10, and extraction electrode systems 5 to 7 for extracting an ion beam from the ion extraction opening 10. The extraction electrode systems 5 to 7 have a first electrode 5 and a second electrode 6 having different potentials in order from the ion extraction opening 10 side. The potential of the first electrode 5 is higher than the potential of the second electrode 6, and a light irradiation device 2 for emitting electrons from the inner wall of the plasma container 4 or the second electrode 6 by the photoelectric effect is provided.SELECTED DRAWING: Figure 1
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Inventors:
ITOI SHUN
FUJITA HIDEKI
SAKAI SHIGEKI
FUJITA HIDEKI
SAKAI SHIGEKI
Application Number:
JP2020205444A
Publication Date:
June 23, 2022
Filing Date:
December 11, 2020
Export Citation:
Assignee:
NISSIN ION EQUIPMENT CO LTD
International Classes:
H01J27/16; H01J37/08; H05H1/46