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Patent Searching and Data


Title:
ION SOURCE
Document Type and Number:
Japanese Patent JPH06223756
Kind Code:
A
Abstract:

PURPOSE: To directly introduce gas to be ionized to a portion high in ionization efficiency by providing a plurality of minute port for jetting gas to be ionized at the tip end section of a gas introduction pipe which is projected so as to be set in an ionization chamber.

CONSTITUTION: When gas 3aB to be ionized is fed to an ionization chamber 1 which undergoes an exciting condition by an ionization means 8, out of minute ports 3aA at the tip 3a of a gas introduction pipe 3 in a projected shape, gas 3aB to be ionized can be fed to a position highest in ionization efficiency within the ionization chamber 1 in an electrically insulated condition. Moreover, since the gas introduction pipe 3 and its tip 3a are formed with insulating material, potential distribution within the ionization chamber 1 will never be disturbed, so that the tip 3a can thereby be positioned at an objective place high in ionization efficiency within the chamber 1.


Inventors:
TSUJIKAWA HIROSHI
SASAKI TAKAO
Application Number:
JP1055393A
Publication Date:
August 12, 1994
Filing Date:
January 26, 1993
Export Citation:
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Assignee:
JAPAN STEEL WORKS LTD
International Classes:
H01J27/16; H01J37/08; (IPC1-7): H01J37/08; H01J27/16
Attorney, Agent or Firm:
Soga Doteru (6 people outside)