Title:
IRRADIATION APPARATUS
Document Type and Number:
Japanese Patent JP2007165624
Kind Code:
A
Abstract:
To provide an irradiation apparatus capable of carrying out optical irradiation while preventing the deformation and/or degradation of an irradiated object.
In a multi-emitter semiconductor laser 1, the displacement (smile S1) of each semiconductor laser device in the direction (Z-axis direction) orthogonal to the arrangement direction (Y-axis direction) thereof is made not larger than the length (height H1) thereof in the Z-axis direction. The reduction in the power density of the irradiating light is suppressed as compared to the conventional case wherein the displacement is larger. Further, higher precision optical irradiation can be carried out for a desired irradiation region.
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Inventors:
HOTTA SHIN
TAKADA MASAHIRO
TAKADA MASAHIRO
Application Number:
JP2005360435A
Publication Date:
June 28, 2007
Filing Date:
December 14, 2005
Export Citation:
Assignee:
SONY CORP
International Classes:
H01L21/268; H01L21/20; H01S5/40; H01L21/31
Domestic Patent References:
JP2004325826A | 2004-11-18 | |||
JPH0897125A | 1996-04-12 | |||
JP2003203874A | 2003-07-18 | |||
JP2000091231A | 2000-03-31 | |||
JPH11346031A | 1999-12-14 |
Attorney, Agent or Firm:
Yoichiro Fujishima
Yasushi Santanzaki
Yasushi Santanzaki