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Title:
照射方向可変イオン照射装置および二次イオン質量分析装置
Document Type and Number:
Japanese Patent JP5338022
Kind Code:
B2
Abstract:

To provide a secondary ion mass spectrometer capable of changing the incident angle of primary ions with respect to a sample without changing a desired detection condition between the sample and a detector.

This secondary ion mass spectrometer includes this irradiation direction-variable ion irradiation device, a sample base, and a mass spectrograph. The irradiation direction-variable ion irradiation device has a mechanism which includes: a fixed ion gun; a first deflection plate capable of controlling the change of the traveling direction of emitted ions, and nearer to the ion gun in an irradiation path; and a second deflection plate capable of controlling the change of the traveling direction of emitted ions, and farther from the ion gun, and in which the first deflection plate and the second deflection plate can rotate independently of each other around a certain point.

COPYRIGHT: (C)2008,JPO&INPIT


Inventors:
Yamazaki Kazutoshi
Yuji Kataoka
Application Number:
JP2006191603A
Publication Date:
November 13, 2013
Filing Date:
July 12, 2006
Export Citation:
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Assignee:
富士通株式会社
International Classes:
H01J49/14; G01N27/62; G01N27/64; H01J49/06
Domestic Patent References:
JP4280054A
JP64082443A
JP7078589A
JP5290797A
JP64059752A
JP2000123773A
JP11354072A
Attorney, Agent or Firm:
Kenji Doi
Hayashi Tsunetoku



 
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