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Title:
JUNCTION MOIETY-FUNCTIONAL BLOCK COPOLYMER
Document Type and Number:
Japanese Patent JP2015120910
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a junction moiety-functional block copolymer that can be used when forming a nono-structure.SOLUTION: A junction moiety-functional block copolymer comprises a first polymer block that is junctioned to a second polymer block by the junction moiety, and in which the junction moiety may comprise one or more electrostatic-charged moiety; the block copolymer may comprise a moiety of formula (I) A-J-B (I), and in which A is first polymer block, B is second polymer block, block A and block B are chemically heterogeneous, J bonds block A to block B, and the junction moiety comprises one or more electrostatic-charged moiety.

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Inventors:
DAMIEN MONTARNAL
LUO YINGDONG
CRAIG J HAWKER
EDWARD J KRAMER
GLENN H FREDRICKSON
Application Number:
JP2014255205A
Publication Date:
July 02, 2015
Filing Date:
December 17, 2014
Export Citation:
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Assignee:
UNIV CALIFORNIA
International Classes:
C08G81/02; B82Y30/00; H01L29/06
Domestic Patent References:
JP2012099209A2012-05-24
JP2011236333A2011-11-24
JP2012036078A2012-02-23
Other References:
A. NUNNS, J. GWYTHER, I. MANNERS: "Inorganic block copolymer lithography", POLYMER, vol. 54, no. 4, JPN6016005946, 5 January 2013 (2013-01-05), GB, pages 1269 - 1284, XP055674835, ISSN: 0003603557, DOI: 10.1016/j.polymer.2012.11.057
Attorney, Agent or Firm:
Longhua International Patent Service Corporation



 
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