Title:
LADDER TYPE HEAT RESISTANT RESIN CONTAINING GERMANIUM ATOM AND SILICON ATOM, AND METHOD FOR PRODUCING THE SAME
Document Type and Number:
Japanese Patent JP3908509
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a high purity ladder type heat resistant resin containing germanium atom and silicon atom, and a method for producing the same.
SOLUTION: This high purity and high molecular weight ladder type polymer which can be suitably used as a protecting film for a semiconductor, an interlayer insulation film, etc., and also can be formed as a thick film, is obtained by hydrolyzing a compound consisting of 1 kind or ≥2 kinds of an organotrialkoxysilane compound, organotrialkoxygermanium compound or organotrichlorosilane compound and containing germanium atom without fail under cooling, then performing a condensation reaction to obtain a high purity ladder polymer containing germanium atom in its main chain and recovering the obtained high purity ladder polymer as a precipitate.
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Inventors:
Naoki Yasuda
Shigeyuki Yamamoto
Shigeyuki Yamamoto
Application Number:
JP2001349200A
Publication Date:
April 25, 2007
Filing Date:
November 14, 2001
Export Citation:
Assignee:
Mitsubishi Electric Corporation
International Classes:
C08G77/58; C08G79/00; (IPC1-7): C08G77/58; C08G79/00
Domestic Patent References:
| JP5066301A | ||||
| JP2001288267A | ||||
| JP11292971A | ||||
| JP8245792A | ||||
| JP1092224A | ||||
| JP64026639A |
Attorney, Agent or Firm:
Sota Asahina
Kei Saki
Kei Saki