積層フィルム - Sumitomo Chemical Co., Ltd.

Title:

積層フィルム

Document Type and Number:

Japanese Patent JP6585226

Kind Code:

B2

Abstract:

A layered film whereby losses in gas-barrier performance when said film is bent can be sufficiently inhibited. Said layered film is provided with a substrate and one thin-film layer formed on at least one surface of said substrate. Said thin-film layer (G) contains silicon, oxygen, and carbon. A carbon distribution curve, which represents the relationship between the distance from the surface of said layer (G) in the thickness direction thereof and the ratio of carbon atoms in said layer (G) to the total number of silicon, oxygen, and carbon atoms (the atomic concentration of carbon) satisfies the following conditions: (i) said carbon distribution curve is essentially continuous; (ii) the atomic concentration of carbon is at least 1 at.% throughout the entire thickness of the layer (G); and (iii) the carbon distribution curve has a sloped region in which the atomic concentration of carbon is increasing and a sloped region in which the atomic concentration of carbon is decreasing.

Inventors:

Akira Hasegawa
Toshiya Kuroda
Takashi Sanada

Application Number:

JP2018089563A

Publication Date:

October 02, 2019

Filing Date:

May 07, 2018

Export Citation:

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