Title:
LASER BEAM LITHOGRAPHIC METHOD
Document Type and Number:
Japanese Patent JP2007313509
Kind Code:
A
Abstract:
To provide a laser beam lithographic method which enables the manufacture of molded products having various shapes and structures without the need to mold extra components such as a support part and with excellent molding cycle.
This laser beam lithographic method comprises the step of providing a resin composition for laser beam lithography, which causes a reversible and rapid sol-gel phase transition upon any physical change of the composition, and imparting "any physical change" to the resin composition to allow the resin composition to rapidly gel and, in this state, exposing the surface of the resin composition to light in a plotting way.
COPYRIGHT: (C)2008,JPO&INPIT
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Inventors:
MURAKAMI TAMOTSU
KAMIMURA AKIYA
KAMIMURA AKIYA
Application Number:
JP2007218980A
Publication Date:
December 06, 2007
Filing Date:
August 24, 2007
Export Citation:
Assignee:
TOUDAI TLO LTD
International Classes:
B05D3/06; C08F2/00; C08F20/00
Attorney, Agent or Firm:
Masayuki Masabayashi
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