Title:
レーザーで生成される紫外線マスク
Document Type and Number:
Japanese Patent JP2007512548
Kind Code:
A
Abstract:
A UV-mask, a system and method for making the mask and a method of using the mask for producing an image a print medium are disclosed. The system includes a donor element having a substrate coated with a layer of IR-sensitive material and a layers of UV-absorbing material, and a receptor element. The IR-sensitive material is capable of detaching a significant portion of the itself and the UV-absorbing material from the donor element and transfer the detached materials to the receptor element when irradiated by an IR radiation. The method for making a UV-mask includes irradiating such a donor element with an IR radiation. The method of using includes overlaying a digital UV mask on a UV-sensitive medium, exposing the medium to a UV radiation through the UV mask, and developing the UV-sensitive medium.
Inventors:
Sweehart, Donald El.
Kidney, Kevin M.
Buckholtz, Richard See.
Kidney, Kevin M.
Buckholtz, Richard See.
Application Number:
JP2006536690A
Publication Date:
May 17, 2007
Filing Date:
October 19, 2004
Export Citation:
Assignee:
Kodak Polychrome Graphics Limited Liability Company
International Classes:
G03F3/10; B41M5/382; B41M5/385; B41M5/392; B41M5/42; B41M5/46; G03F1/00
Attorney, Agent or Firm:
Atsushi Aoki
Takashi Ishida
Tetsuji Koga
Yoshihiro Kobayashi
Takashi Ishida
Tetsuji Koga
Yoshihiro Kobayashi