PURPOSE: To perform mass spectrometry of a material in high sensitivity by deflection-scanning an ion beam of irradiating a sample in an irradiation direction of a laser beam, and moving a sample base in a vertical direction to the laser beam irradiation direction.
CONSTITUTION: An ion beam 2 is made to pass through between a pair of electrostatic deflecting plates 4, connected to an X-axis scanning control device 3, and through an ion beam lens 5, to irradiate a sample 8 set up on a sample base 7 connected to a Y-axis scanning control device 6. A neutral particle 9, emitted from the sample 8, is irradiated with a laser beam 11 from an X-axis direction and ionized, to detect mass by a mass spectrometer 12. Then, voltage is applied to the electrostatic deflecting plate 4, while controling the movement of the sample base 7 ion a Y-axis direction by a chopping wave-shaped repeated signal, so as to scan a two-dimensional region on the sample 8 with the ion beam 2. In this way, high sensitive depth analysis and two-dimensional analysis of the sample 8 can be performed.
| WO/1986/001335 | METHOD AND APPARATUS FOR THE MICRO-ANALYSIS OR IMAGING OF SAMPLES |
| JPS58165968 | 【考案の名称】電子線走査型分析装置 |
OSABE SATOSHI
KANEBORI KEIICHI
