To provide a configuration capable of frequency-converting a pulse laser beam in which the pulse width per pulse is in a range not more than a picosecond, while suppressing noise light.
The laser machining apparatus 1 is provided with a laser emitter 11 for oscillating at a predetermined first frequency and outputting a pulse laser beam in which the pulse width per pulse is in the range not more than pico/sec; a pulse picker 14 for converting a pulse laser beam to be emitted from the laser emitter 11 into a second frequency lower than a first frequency of the laser emitter 11, and outputting the converted laser beam; a main amplifier 13 for amplifying the pulse laser beam emitted from the pulse picker 14; and a convergence lens 22 for allowing the pulse laser beam amplified in the main amplifier 13 to converge, and irradiating a workpiece W with the pulse laser beam. Further, an oversaturation absorbing body is disposed on an optical path of the pulse laser beam in a poststage side of the pulse picker 14.
JPH09252282A | 1997-09-22 | |||
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JP2005152960A | 2005-06-16 | |||
JPH09298333A | 1997-11-18 | |||
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JPH07221706A | 1995-08-18 |
US20050226286A1 | 2005-10-13 |
Jiro Murakami
Keiko Mizusawa
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