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Title:
LASER MACHINING APPARATUS
Document Type and Number:
Japanese Patent JP2008060139
Kind Code:
A
Abstract:

To provide a configuration capable of frequency-converting a pulse laser beam in which the pulse width per pulse is in a range not more than a picosecond, while suppressing noise light.

The laser machining apparatus 1 is provided with a laser emitter 11 for oscillating at a predetermined first frequency and outputting a pulse laser beam in which the pulse width per pulse is in the range not more than pico/sec; a pulse picker 14 for converting a pulse laser beam to be emitted from the laser emitter 11 into a second frequency lower than a first frequency of the laser emitter 11, and outputting the converted laser beam; a main amplifier 13 for amplifying the pulse laser beam emitted from the pulse picker 14; and a convergence lens 22 for allowing the pulse laser beam amplified in the main amplifier 13 to converge, and irradiating a workpiece W with the pulse laser beam. Further, an oversaturation absorbing body is disposed on an optical path of the pulse laser beam in a poststage side of the pulse picker 14.


Inventors:
RAKESH BHANDARI
Application Number:
JP2006232132A
Publication Date:
March 13, 2008
Filing Date:
August 29, 2006
Export Citation:
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Assignee:
SUNX LTD
International Classes:
H01S3/10; B23K26/00; B23K26/064; B23K26/073; G02F1/35
Domestic Patent References:
JPH09252282A1997-09-22
JP2000031905A2000-01-28
JP2005152960A2005-06-16
JPH09298333A1997-11-18
JP2000101175A2000-04-07
JP2006049491A2006-02-16
JP2002031824A2002-01-31
JPH07221706A1995-08-18
Foreign References:
US20050226286A12005-10-13
Attorney, Agent or Firm:
Arisa Ushiro
Jiro Murakami
Keiko Mizusawa