マルチスケール変形計測用格子パターンとその製作方法 - National Institute of Advanced Industrial Science and Technology

Title:

マルチスケール変形計測用格子パターンとその製作方法

Document Type and Number:

Japanese Patent JP6404070

Kind Code:

B2

More Like This:

JP5194040	Display device and inspection device
JP2005203580	PROCESSING METHOD OF SEMICONDUCTOR WAFER, AND GRINDING STRAIN VALIDATION APPARATUS
JP2017530335	Real-time video stretcher

Inventors:

Wang Qing Hua
Lee Zhiyuan
Hiroshi Tsuda

Application Number:

JP2014203358A

Publication Date:

October 10, 2018

Filing Date:

October 01, 2014

Export Citation:

Assignee:

National Institute of Advanced Industrial Science and Technology

International Classes:

G01B11/16; G01B15/06; G01B21/32

Domestic Patent References:

Previous Patent: 合金ナノ粒子含有カーボン電極、当該電極を含む装置、及び、当該電極の�...

Next Patent: 蓄電デバイス用セパレータの製造方法