Title:
LEVENSON MASK
Document Type and Number:
Japanese Patent JP2006011370
Kind Code:
A
Abstract:
To provide a Levenson mask which allows an eaves to be directly and accurately measured in size.
The Levenson mask comprises a quartz substrate 2 having a dug portion 9 in a part of the main surface, and a Cr film 3 deposited on the main surface. The dug portion 9 includes an undercut portion 23 formed to allow a part of the Cr film 3 to serve as an eaves. The Cr film 3 has a π opening 11 formed to expose a portion of the dug portion 9, and a first subopening 15 to expose an end 21 of the dug portion 9.
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Inventors:
AOYAMA SATORU
Application Number:
JP2005106163A
Publication Date:
January 12, 2006
Filing Date:
April 01, 2005
Export Citation:
Assignee:
RENESAS TECH CORP
International Classes:
G03C5/00; G03F1/30; G03F1/68; G03F7/20; G03F9/00; H01L21/027
Domestic Patent References:
| JP2003344987A | 2003-12-03 | |||
| JP2002040624A | 2002-02-06 | |||
| JP2003315981A | 2003-11-06 | |||
| JP2002311568A | 2002-10-23 | |||
| JP2003344987A | 2003-12-03 | |||
| JP2002040624A | 2002-02-06 | |||
| JP2003315981A | 2003-11-06 | |||
| JP2002311568A | 2002-10-23 |
Attorney, Agent or Firm:
Kuro Fukami
Toshio Morita
Yoshihei Nakamura
Yutaka Horii
Hisato Noda
Masayuki Sakai
Toshio Morita
Yoshihei Nakamura
Yutaka Horii
Hisato Noda
Masayuki Sakai
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